E425: Engineering Design V
TCAD: Process and Device Simulation
X. ZHOU
©
1997
Step 33: Simulated Structure
Step 33:
Contact photolithography
:
Mask: CONTACT; Deposit positive photoresist; Masking; Exposure; Development.
Cross-Sectional View
Input Command
$step load_mask
mask in.file=layout:0_0.tl1
$step contact_mask
deposit photo thick=1
expose mask=CONTACT
develop