Facilities in SpinLab

Sample and Device Fabrication

AJA1800 Sputtering tool
6 targets, DC magnetron, RF sputtering and RF etching
A thin film stack containing 5 metallic layers and 1 insulating layers can be deposited

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AJA2200 Sputtering tool
12 targets, DC magnetron and RF sputtering, co-sputtering for composition tuning

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AJA Ion Milling tool
Ion milling tool with 1 sputter gun for SiO2 coating

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MicroWriter ML3 model Maskless lithography
Maskless lithography, 1.5um resolution
Custom patterns can be drawn using PAINT or KLayout and lithography can be carried out without masks

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NanoFrazor lithography
Mask less lithography for nanostructures, 30 nm resolution

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NILT Nanoimprint lithography
Imprint lithography, sub-100 nm resolution
Lithography on 4" substrates can be carried out at high throughputs, for mass fabrication of patterns.

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Wetbench (spin coater, ultrasonic cleaner, hotplate etc.)
Spin coater, ultrasonic cleaner, hotplate etc.

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Wirebonder
Wirebonders for electrical connections

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Characterization tools

Electromagnet
Electromagnet with 1.5-2 T magnetic field for various measurements

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Electrical device measurements
Electrical measurements (in the presence of a magnet) using Keithley voltage and current sources etc.

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MagVision Kerr Microscopy
Kerr Microscopy / hysteresis loops in magnetic fields of about 1T in vertical directiion, 0.5 T any direction
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Electrical probes for Kerr Microscopy system
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Domain wall propagation in a magnetic material with a perpendicular magnetic anisotropy, observed using Kerr Microscopy. If black implies north poles up, grey implies south poles up

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Atomic Force Microscopy
Atomic force microscopy can be measured using NanoFrazor tool

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Workstations for simulations
Workstations with GPUs for micromagnetic simulations

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Common facilities
Various common facilities such as MFM/VSM/XRD etc. are available

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