A Novel Approach to Compact I-V Modeling
for Deep-Submicron MOSFET's Technology Development with Process Correlation
Xing Zhou and Khee Yong Lim
School of Electrical & Electronic Engineering, Nanyang Technological
University, Nanyang Avenue, Singapore 639798
Phone: (65) 790-4532. Fax: (65) 791-2687. Email:
exzhou@ntu.edu.sg
Proc. of the 3rd International Conference on
Modeling and Simulation of Microsystems (MSM2000)
San Diego, CA, U.S.A., March 27-29, 2000, pp. 333-336.
Copyright | Abstract
| References | Citation | Figures
| Reprint
|
Slide
|
Movie
|
Back
Copyright Notice
© 2000 Computational Publications. Personal use of this material
is permitted. However, permission to reprint/republish this material for
advertising or promotional purposes or for creating new collective works
for resale or redistribution to servers or lists, or to reuse any copyrighted
component of this work in other works must be obtained from Computational
Publications.
Abstract
This paper presents a novel approach to formulating compact I-V
models for deep-submicron MOS technology development. The developed
model is a one-region closed-form equation that resembles the same form
as the long-channel one, which covers full range of channel length and
bias conditions. Model parameter extraction follows a one-iteration
prioritized sequence with minimum measurement data, and can be correlated
to process variables.
References
-
[1] X. Zhou and K. Y. Lim, “Unified MOSFET compact model formulation through
physics-based effective transformation,” submitted for publication.
-
[2] X. Zhou, K. Y. Lim, and D. Lim, IEEE Trans. Electron Devices, vol.
46, pp. 807–809, Apr. 1999.
-
[3] K. Y. Lim, X. Zhou, and D. Lim, Proc. MSM99, Puerto Rico, Apr. 1999,
pp. 423–426.
-
[4] X. Zhou, K. Y. Lim, and D. Lim, IEEE Trans. Electron Devices, vol.
47, pp. 214–221, Jan. 2000.
-
[5] A. G. Sabnis and J. T. Clemens, IEDM Tech. Dig., 1979, pp. 18–21.
-
[6] Y. Cheng et al., BSIM3v3 Manual, University of California, Berkeley,
1996.
-
[7] X. Zhou and K. Y. Lim, Proc. ISDRS-99, Charlottesville, VA, Dec. 1999,
pp. 423–426.
-
[8] P. K. Ko, VLSI Electronics: Microstructure Science, vol. 18, p. 25,
1988.
-
[9] G. Niu, J. D. Cressler, S. J. Mathew, and D. C. Ahlgren, IEEE Electron
Device Lett., vol. 20, pp. 520–522, Oct. 1999.
-
[10] T. Tang and X. Zhou, J. Modeling and Simulation of Microsystems, vol.
1, no. 2, pp. 83–89, Dec. 1999.
Citation
-
[13] K. Y. Lim and X. Zhou, "A physically-based
semi-empirical series resistance model for deep-submicron MOSFET I-V modeling,"
IEEE Trans. Electron Devices, Vol. 47, No. 6, pp. 1300-1302, June 2000.
-
[24] X. Zhou and K. Y. Lim, "Unified
MOSFET compact I-V model formulation through physics-based effective transformation,"
IEEE Trans. Electron Devices, Vol. 48, No. 5, pp. 887-896, May 2001.
-
[20] X. Zhou, S. B. Chiah, K.
Y. Lim, Y. Wang, X. Yu, S. Chwa, A. See, and L. Chan, "Technology-dependent
modeling of deep-submicron MOSFET's and ULSI circuits," (Invited Paper),
Proc. 6th International Conference on Solid-State and Integrated-Circuit
Technology (ICSICT-2001), Shanghai, Oct. 2001, Vol. 2, pp. 855-860.